Structural, Compositional, Morphological, And Optical Properties of Electrodeposited Nanocrystalline ZnO Thin Film |
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BibTeX: |
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@article{IJIRSTV1I12132, |
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Abstract: |
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ZnO is a wide band-gap (3.37 eV) II–VI compound semiconductor with hexagonal wurtzite structure. These films were deposited by electrodeposition technique, containing very low concentrations of sodium citrate and 30% hydrogen peroxide. Ammonium hydroxide is added to control the reaction. The structural, compositional, Surface morphology and optical analysis were studied by X-ray diffraction (XRD), Energy-dispersive X-ray spectroscopy (EDS), Scanning Electron Microscope (SEM), and Atomic Force Microscopy (AFM).The hexagonal structure of ZnO (101) is observed with average grain size 48nm. The average RMS surface roughness of the film is observed to be 328.621nm. The bandgap of the ZnO film is observed to be 3.35 eV. The strong peak of ZnO at 381 nm is observed in photoluminescence spectroscopy. |
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Keywords: |
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Zinc Oxide, Thin Film, Electrodeposition, Characterization etc |
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